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Multiphoton Lithography: Techniques, Materials, and - download pdf or read online

By J?rgen Stampfl, Robert Liska, Aleksandr Ovsianikov

ISBN-10: 3527682686

ISBN-13: 9783527682683

This primary publication in this attention-grabbing, interdisciplinary subject meets the much-felt want for an up to date evaluate of the field.
Written with either newcomers and pros in brain, this prepared reference starts off with an introductory part explaining the fundamentals of many of the multi-photon and photochemical procedures including an outline of the gear wanted. A workforce of top foreign specialists presents the newest examine effects on such fabrics as new photoinitiators, hybrid photopolymers, and steel carbon nanotube composites. in addition they disguise promising functions and potential developments, together with photonic crystals, microfluidic units, organic scaffolds, metamaterials, waveguides, and functionalized hydrogels.
by means of bringing jointly the necessities for either commercial and educational researchers, this is often a useful better half for fabrics scientists, polymer chemists, floor chemists, floor physicists, biophysicists, and clinical scientists operating with 3D micro- and nanostructures.

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Extra resources for Multiphoton Lithography: Techniques, Materials, and Applications (1)

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18, S151–S157. N. A. (2013) Equations of Mathematical Physics, Courier Corp. G. (2005) Picosecond 21 22 1 Rapid Laser Optical Printing in 3D at a Nanoscale 52. 53. 54. 55. 56. 57. 58. 59. high-repitition-rate pulsed laser ablation of dielectrics: the effect of energy accumulation between pulses. Opt. , 44, 051102. D. (1996) Nanosecond-tofemtosecond laser-induced breakdown in dielectrics. Phys. Rev. B, 53 (4), 1749–1761. G. V. (2013) Physics of ultra-short laser interaction with matter: from phonon excitation to ultimate transformations.

The avalanche is even more dominant at lower pulse energies. When the pulse energy is considerably higher than the breakdown threshold, the multiphoton rate catches up with the avalanche and material experiences the breakdown at a very early stage of the laser pulse. The rest of pulse interacts with plasma and creates micro-explosion. 1 shows the comparison of laser fabrication windows with another popular longer wavelength 1030 nm, where many femtosecond fiber lasers are also available. Very narrow spread of pulse energies is available for the fabrication of 3D structures in undoped SZ2080 resist, almost limited by the laser stability.

The rest of pulse interacts with plasma and creates micro-explosion. 1 shows the comparison of laser fabrication windows with another popular longer wavelength 1030 nm, where many femtosecond fiber lasers are also available. Very narrow spread of pulse energies is available for the fabrication of 3D structures in undoped SZ2080 resist, almost limited by the laser stability. The window is much wider in the resist with a photoinitiator. 4; and scanning speed 100 μm s−1 . 2) achievable resolution becomes worse in the case of photoinitiator-doped resist due to stronger absorption, avalanche, and heating at the focus [28].

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Multiphoton Lithography: Techniques, Materials, and Applications (1) by J?rgen Stampfl, Robert Liska, Aleksandr Ovsianikov


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